On Tuesday, February 6, Epson will host the 4th annual Epson Digital Couture Project in New York City. The event will bring together 13 designers from across the Americas who have used Epson’s dye-sublimation printing technology to create unique textiles for their collections.
“Epson brings me to a real, defined and clear experience in my creativity when it comes to seeing my inspiration embodied in the pieces, in my textiles, and in my fibers,” said Colombian designer Lina Cantillo in a statement.
“Being able to have a tool like the Epson sublimation printers solves one of the biggest difficulties that we designers have,” said Paraguayan designer Ilse Jara. “[That] is to accurately capture our creativity in different types of genres and thus offer more of our art in the best way possible. precise and unique to the world”
Prior to the showcase, Epson will host a panel exploring the ways digital technology is evolving within the fashion industry. Anthony Cenname, vice president and publisher at WSJ Magazine will moderate, with opening comments from Epson’s President and CEO Keith Kratzberg, and closing comments from Kenichi Yamamoto, Epson’s general manager of commercial and industrial printer sales and marketing. Panel participants include interior designer Ryan Korban, Mark Sunderland from Thomas Jefferson University, Aliza Licht, EVP brand marketing and communications for Alice + Olivia, and fashion critic and analyst Anna Fusoni.
Joining designers Lina Cantillo and Ilse Jara on Epson’s runway will be Michele Gevard of Brazil, Hayley Elsaesser of Canada, Karyn Coo of Chile, Stephanie Ruiz of Ecuador, Eduardo Figueroa of Guatemala, Emilio Mata of Mexico, Ana Maria Guiulfo of Peru, and Candice Cuoco, Fernando Alberto, Alexandra Pizzigoni and Patricia Franklin, and Gabriel Asfour, Angela Donhauser, and Adi Gil of threeASFOUR from the United States.
Check out more sketches from some of the featured designers below. If these are any indication, it’s going to be a pretty wild and wonderful show.